Plasma processing and processing science  [electronic resource] / 
Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council. 
 - Washington, D.C. :  National Academy Press,  1995. 
 - x, 35 p. 
 - NRL strategic series .
 - NRL strategic series. .
<br/><br/> Committee chair:  Francis F. Chen.  This work was performed under Department of Navy Contract N00014-93-C-0089 issued by the Office of Naval Research under contract authority NR 201-124. 
<br/><br/><br/>Electronic reproduction. <br/>Palo Alto, Calif. : <br/>ebrary, <br/>2009. <br/>Available via World Wide Web. <br/>Access may be limited to ebrary affiliated libraries. 
<br/><br/><label>ISBN: </label>
<br/><br/><label>Subjects--Topical Terms: </label><br/>Plasma engineering.<br/>Semiconductors--Etching.<br/>Plasma etching.
<br/><br/><label>Index Terms--Genre/Form: </label><br/>Electronic books.
<br/><br/><label>LC Class. No.: </label>TA2020  / .P5 1995eb 
<br/><br/><label>Dewey Class. No.: </label>621.044