| 000 | 01863cam a2200457Ii 4500 | ||
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| 999 |
_c160588 _d160588 |
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| 001 | vtls003260530 | ||
| 003 | MY-SjTCS | ||
| 005 | 20211201183351.0 | ||
| 006 | m o d | ||
| 007 | cr ||||||||||| | ||
| 008 | 141204t20142015flua ob 000 0 eng d | ||
| 020 | _a9781466517318 (electronic bk.) | ||
| 020 | _a146651731X (electronic bk.) | ||
| 020 | _z9781466517288 | ||
| 035 | _a(OCoLC)884012539 | ||
| 035 | _aocn884012539 | ||
| 039 | 9 |
_a201809071401 _bVLOAD |
|
| 040 |
_aEBLCP _beng _erda _epn _cEBLCP _dOCLCO _dCUS _dN$T _dYDXCP |
||
| 082 | 0 | 4 | _a620.19204295 |
| 100 | 1 |
_aNakamura, Kenichiro _c(Chemical engineer), _eauthor. |
|
| 245 | 1 | 0 |
_aPhotopolymers : _bphotoresist materials, processes, and applications / _cKenichiro Nakamura. |
| 264 | 1 |
_aBoca Raton, FL : _bCRC Press/Taylor and Francis Group, _c[2014] |
|
| 264 | 4 | _c©2015. | |
| 300 |
_a1 online resource (x, 188 pages) : _billustrations. |
||
| 336 |
_atext _2rdacontent |
||
| 337 |
_acomputer _2rdamedia |
||
| 338 |
_aonline resource _2rdacarrier |
||
| 490 | 1 | _aOptics and Photonics | |
| 504 | _aIncludes bibliographical references and index. | ||
| 588 | _aDescription based upon print version of record. | ||
| 650 | 0 |
_aMicroelectronics _xMaterials. |
|
| 650 | 0 | _aPhotopolymerization. | |
| 650 | 0 |
_aPhotopolymers _xIndustrial applications. |
|
| 650 | 0 | _aPhotopolymers. | |
| 650 | 0 | _aPhotoresists. | |
| 655 | 4 | _aElectronic books. | |
| 776 | 0 | 8 |
_iPrint version: _aNakamura, Kenichiro _tPhotopolymers : Photoresist Materials, Processes, and Applications _dHoboken : Taylor and Francis,c2014 _z9781466517288 |
| 830 | 0 | _aOptics and photonics. | |
| 856 | 4 | 0 |
_uhttps://ezproxy.taylors.edu.my/login?url=http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=815310 _zAn electronic book accessible through the World Wide Web; click to view |
| 999 | _d160588 | ||