000 00929nam a2200241 a 4500
001 vtls003144002
003 MY-SjTCS
005 20200226110838.0
008 110218s2009 nju 001 0 eng d
020 _a9780470471555 (Wiley-Interscience : hbk.)
020 _a0470471557 (Wiley- Interscience : hbk.)
039 9 _a201212081105
_bshuhada
_c201212081101
_dshuhada
_c201102181738
_dVLOAD
_c200910291941
_dmas
_y200906161741
_zshahriman
082 0 4 _a621.3815
_bEUV
245 0 0 _aEUV lithography /
_cVivek Bakshi, editor.
260 _aBellingham, Wash. :
_bSPIE Press ;
_aHoboken, NJ :
_bJohn Wiley,
_cc2009.
300 _axxvii, 673 p. :
_bill. ;
_c27 cm.
504 _aIncludes bibliographical references and index.
650 0 _aUltraviolet radiation
_xIndustrial applications.
_934815
650 0 _aPhotolithography.
_934816
650 0 _aOptical coatings.
_934817
700 1 _aBakshi, Vivek.
_934818
920 _aADTP : 132155
999 _c72995
_d72995