000 | 00929nam a2200241 a 4500 | ||
---|---|---|---|
001 | vtls003144002 | ||
003 | MY-SjTCS | ||
005 | 20200226110838.0 | ||
008 | 110218s2009 nju 001 0 eng d | ||
020 | _a9780470471555 (Wiley-Interscience : hbk.) | ||
020 | _a0470471557 (Wiley- Interscience : hbk.) | ||
039 | 9 |
_a201212081105 _bshuhada _c201212081101 _dshuhada _c201102181738 _dVLOAD _c200910291941 _dmas _y200906161741 _zshahriman |
|
082 | 0 | 4 |
_a621.3815 _bEUV |
245 | 0 | 0 |
_aEUV lithography / _cVivek Bakshi, editor. |
260 |
_aBellingham, Wash. : _bSPIE Press ; _aHoboken, NJ : _bJohn Wiley, _cc2009. |
||
300 |
_axxvii, 673 p. : _bill. ; _c27 cm. |
||
504 | _aIncludes bibliographical references and index. | ||
650 | 0 |
_aUltraviolet radiation _xIndustrial applications. _934815 |
|
650 | 0 |
_aPhotolithography. _934816 |
|
650 | 0 |
_aOptical coatings. _934817 |
|
700 | 1 |
_aBakshi, Vivek. _934818 |
|
920 | _aADTP : 132155 | ||
999 |
_c72995 _d72995 |